Author Topic: Underbasing the opacity mask distress pattern inside AI  (Read 2587 times)

Offline Dottonedan

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Re: Underbasing the opacity mask distress pattern inside AI
« Reply #15 on: May 24, 2017, 04:35:18 PM »
A job like this is where documentation benefits greatly.
Once you landed on where you wanted it to look the first time, you should have documentation on every step for press.


Ink type, ink modification, pressure, speed, angle, duro, off contact, mesh, lpi, print sequence etc.
All those are key components to setting it up faster and consistent prints.


Do this and it will be very close if not exact the next time.
Artist & Sim Process separator, Co owner of The Shirt Board, Past M&R Digital tech installer for I-Image machines. Over 28 yrs in the apparel industry. Apparel sales, http://www.designsbydottone.com  e-mail art@designsbydottone.com 615-821-7850